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DataTítuloAutor(es)TipoAcesso
1-Jan-2015Ag (y) :TiN (x) thin films for dry biopotential electrodes: the effect of composition and structural changes on the electrical and mechanical behavioursPedrosa, P.; Machado, D.; Borges, Joel Nuno Pinto, et al.ArtigoAcesso restrito UMinho
28-Jul-2004Atomic environment and interfacial structural order of TiAlN/Mo multilayersTavares, C. J.; Rebouta, L.; Rivière, J. P., et al.ArtigoAcesso aberto
2015Biological behaviour of thin films consisting of Au nanoparticles dispersed in a TiO2 dielectric matrixBorges, Joel Nuno Pinto; Costa, D.; Antunes, E., et al.ArtigoAcesso restrito UMinho
15-Ago-2017Characterization of magnetron sputtered sub-stoichiometric CrAlSiNx and CrAlSiOyNx coatingsAl-Rjoub, A.; Costa, P.; Rebouta, L., et al.ArtigoAcesso aberto
2012Characterization of TiAlSiN/TiAlSiON/SiO2 optical stack designed by modelling calculations for solar selective applicationsRebouta, L.; Capela, Paulina Araújo; Andritschky, M., et al.ArtigoAcesso aberto
16-Set-2008Charging effects in CdSe nanocrystals embedded in SiO2 matrix produced by rf magnetron sputteringLevichev, S.; Chahboun, A.; Basa, P., et al.ArtigoAcesso restrito UMinho
15-Jun-2023Combining x-ray real and reciprocal space mapping techniques to explore the epitaxial growth of semiconductorsMagalhaes, S.; Cabaco, J. S.; Concepcion, O., et al.ArtigoAcesso restrito UMinho
3-Set-2015Composition and structure variation for magnetron sputtered tantalum oxynitride thin films, as function of deposition parametersCristea, D.; Pătru, M.; Crisan, A., et al.ArtigoAcesso restrito UMinho
Mar-2019Compositional analysis by RBS, XPS and EDX of ZnO:Al,Bi and ZnO:Ga,Bi thin films deposited by d.c. magnetron sputteringRibeiro, J. M.; Correia, Filipe Costa; Salvador, Paulo Miguel Babo Cunha, et al.ArtigoAcesso restrito UMinho
21-Jul-2022Confronting Vegard's rule in Ge1-x Sn (x) epilayers: from fundamentals to the effect of defectsMagalhaes, S.; Dias, M.; Nunes, B., et al.ArtigoAcesso aberto
2012Controlling the properties of layered self-organized Ge clusters in silica matrixPinto, S. R. C.; Roldan, M. A.; Buljan, Maja, et al.Resumo em ata de conferência Acesso aberto
Out-2020Corrigendum to “Compositional analysis by RBS, XPS and EDX of ZnO:Al,Bi and ZnO:Ga,Bi thin films deposited by d.c. magnetron sputtering” [Vacuum 161 (2019) 268–275]Ribeiro, J. M.; Correia, Filipe Costa; Salvador, Paulo Miguel Babo Cunha, et al.CorrigendaAcesso restrito UMinho
12-Set-2017Corrosion behavior of titanium oxynitrided by diffusion and magnetron sputtering methods in physiological solutionPohrelyuk, I. M.; Yaskiv, O. I.; Tkachuk, O. V., et al.ArtigoAcesso restrito UMinho
Dez-2004Corrosion behaviour of single layered ZrNxOy thin films in artificial sweat solutionsAriza, E.; Rocha, L. A.; Ferreira, S. C., et al.Artigo em ata de conferênciaAcesso aberto
Abr-2003Corrosion behaviour of substoichiometric TiNx films produced by DC magnetron sputteringAriza, E.; Rocha, L. A.; Vaz, F., et al.Artigo em ata de conferênciaAcesso aberto
2004Corrosion resistance of ZrNxOy thin films obtained by rf reactive magnetron sputteringAriza, E.; Rocha, L. A.; Vaz, F., et al.ArtigoAcesso aberto
2019CrAlSiN barrier layer to improve the thermal stability of W/CrAlSiNx/ CrAlSiOyNx/SiAlOx solar thermal absorberAl-Rjoub, A.; Rebouta, L.; Costa, P., et al.ArtigoAcesso aberto
2010Crystal size and crystalline volume fraction effects on the Erbium emission of nc-Si:Er grown by r.f. sputteringCerqueira, M. F.; Stepikhova, M.; Kozanecki, A., et al.ArtigoAcesso aberto
2021Deposition of Ti-Zr-O-N films by reactive magnetron sputtering of Zr target with Ti ribbonsda Silva Oliveira, C.I.; Martínez Martinez, Diego; Cunha, L., et al.ArtigoAcesso aberto
1-Mai-2019Deposition temperature influence on the wear behaviour of carbon-based coatings deposited on hardened steelFeldiorean, D.; Cristea, D.; Tierean, M., et al.ArtigoAcesso aberto