Utilize este identificador para referenciar este registo: https://hdl.handle.net/1822/13774

TítuloThe annealing effect on structural and optical properties of ZnO thin films produced by RF sputtering
Autor(es)Rolo, Anabela G.
Campos, J. Ayres de
Viseu, T. M. R.
Arôso, T. de Lacerda
Cerqueira, M. F.
Palavras-chaveZnO
Thin films
X-ray
Raman
Stress
Data2007
EditoraElsevier
RevistaSuperlattices and Microstructures
Resumo(s)In this work, a study of the structure and optical properties of undoped ZnO thin films produced by r.f. magnetron sputtering technique as a function of the growth parameters is reported. Modification under annealing conditions is also analysed. Raman spectroscopy, X-ray photoelectron spectroscopy, X-ray diffraction and optical transmittance have been used. From the position of the (002) X-ray diffraction peak and the E2 (high) mode detected in Raman spectra, the residual stress both in the as-grown and in the annealed samples has been estimated.
TipoArtigo
URIhttps://hdl.handle.net/1822/13774
DOI10.1016/j.spmi.2007.04.069
ISSN0749-6036
Versão da editorahttp://www.sciencedirect.com/science/article/pii/S0749603607001036
Arbitragem científicayes
AcessoAcesso aberto
Aparece nas coleções:CDF - FMNC - Artigos/Papers (with refereeing)

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