Utilize este identificador para referenciar este registo:
https://hdl.handle.net/1822/15689
Título: | Low-temperature fabrication of layered self organized ge clusters by RF-sputtering |
Autor(es): | Pinto, S. R. C. Rolo, Anabela G. Buljan, M. Chahboun, A. Bernstorff, S. Barradas, N. P. Alves, E. Kashtiban, R. J. Bangert, U. Gomes, M. J. M. |
Palavras-chave: | GISAXS grazing incidence small angle X-ray scattering HRTEM high resolution transmission electron microscopy NCs: nanocrystals Ge clusters RBS: Rutherford backscattering spectrometry XPS: X-ray photoelectron spectroscopy Raman spectroscopy Magnetron sputtering (Ge + SiO2) / SiO2 multilayers Low temperature |
Data: | 14-Abr-2011 |
Editora: | Springer Verlag |
Revista: | Nanoscale Research Letters |
Resumo(s): | In this article, we present an investigation of (Ge + SiO2)/SiO2 multilayers deposited by magnetron sputtering and subsequently annealed at different temperatures. The structural properties were investigated by transmission electron microscopy, grazing incidence small angles X-ray scattering, Rutherford backscattering spectrometry, Raman, and X-ray photoelectron spectroscopies. We show a formation of self-assembled Ge clusters during the deposition at 250°C. The clusters are ordered in a three-dimensional lattice, and they have very small sizes (about 3 nm) and narrow size distribution. The crystallization of the clusters was achieved at annealing temperature of 700°C. |
Tipo: | Artigo |
URI: | https://hdl.handle.net/1822/15689 |
DOI: | 10.1186/1556-276X-6-341 |
ISSN: | 1556-276X |
Versão da editora: | http://www.nanoscalereslett.com/ |
Arbitragem científica: | yes |
Acesso: | Acesso aberto |
Aparece nas coleções: | CDF - FCT - Artigos/Papers (with refereeing) CDF - FMNC - Artigos/Papers (with refereeing) |
Ficheiros deste registo:
Ficheiro | Descrição | Tamanho | Formato | |
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Low-temperature fabrication of layered self organized.pdf | 675,48 kB | Adobe PDF | Ver/Abrir |