Utilize este identificador para referenciar este registo: https://hdl.handle.net/1822/16468

TítuloCharging effects in CdSe nanocrystals embedded in SiO2 matrix produced by rf magnetron sputtering
Autor(es)Levichev, S.
Chahboun, A.
Basa, P.
Rolo, Anabela G.
Barradas, N. P.
Alves, E.
Horvath, Zs. J.
Conde, O.
Gomes, M. J. M.
Palavras-chaveCdSe
Nanocrystals
SiO2
Charging effect
Data16-Set-2008
EditoraElsevier
RevistaMicroelectronic Engineering
Resumo(s)Charging effects in CdSe nanocrystals embedded in SiO2 matrix fabricated by rf magnetron co-sputtering technique were electrically characterized by means of capacitance–voltage (C–V) combined with current–voltage (I–V). The presence of CdSe nanocrystals was demonstrated by X-ray diffraction technique. The average size of nanocrystals was found to be approximately 3 nm. The carriers transport in the CdSe/SiO2 structure was shown to be a combination of Fowler–Nordheim tunnelling and Poole–Frenkel mechanisms. A memory effect was demonstrated and a retention time was measured.
TipoArtigo
DescriçãoS.L. thanks FCT for the financial support through the Grant SFRH/BPD/26532/ 2006.
URIhttps://hdl.handle.net/1822/16468
DOI10.1016/j.mee.2008.09.003
ISSN0167-9317
Versão da editorahttp://www.sciencedirect.com/science/article/pii/S0167931708003948
Arbitragem científicayes
AcessoAcesso restrito UMinho
Aparece nas coleções:CDF - FMNC - Artigos/Papers (with refereeing)

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