Utilize este identificador para referenciar este registo:
https://hdl.handle.net/1822/48549
Título: | Chemical vapour deposition of hexagonal boron nitride for two dimensional electronics |
Autor(es): | Sompalle, Balaji Borme, Jérôme Cerqueira, Fátima Sun, Tangyou Campos, Rui Alpuim, P. |
Palavras-chave: | Hexagonal Boron Nitride Chemical Vapor Deposition Ammonia borane Graphene electronics |
Data: | 24-Nov-2017 |
Editora: | Universidade do Porto. Faculdade de Engenharia (FEUP) |
Revista: | U.Porto Journal of Engineering |
Resumo(s): | Hexagonal boron nitride (h-BN) has potential applications in protective coatings, single photon emitters and as substrate for graphene electronics. In this paper, we report on the growth of h-BN by chemical vapor deposition (CVD) using ammonia borane as the precursor. Use of CVD allows controlled synthesis over large areas defined by process parameters, e.g. temperature, time, process chamber pressure and gas partial pressures. Furthermore, independently grown graphene and h-BN layers are put together to realize enhancement in electronic properties of graphene. |
Tipo: | Artigo |
URI: | https://hdl.handle.net/1822/48549 |
DOI: | 10.24840/2183-6493.003.003.0003 |
ISSN: | 2183-6493 |
e-ISSN: | 2183-6493 |
Versão da editora: | https://journalengineering.fe.up.pt/article/view/429 |
Arbitragem científica: | yes |
Acesso: | Acesso aberto |
Aparece nas coleções: | CDF - CEP - Artigos/Papers (with refereeing) |
Ficheiros deste registo:
Ficheiro | Descrição | Tamanho | Formato | |
---|---|---|---|---|
U.Porto Journal of Engineering, 3-3 (2017) 27-34.pdf | 620,17 kB | Adobe PDF | Ver/Abrir |
Este trabalho está licenciado sob uma Licença Creative Commons