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|Title:||Structural and electrical properties of Al doped ZnO thin films deposited at room temperature on poly(vinilidene fluoride) substrates|
de Lacerda-Arôso, T.
Viseu, T. M. R.
Tavares, C. J.
Reactive magnetron sputtering
|Publisher:||Elsevier Science SA|
|Journal:||Thin Solid Films|
|Abstract(s):||Transparent, conducting, Al-doped ZnO films have been deposited, by dc and pulsed dc magnetron sputtering, on glass and electroactive polymer (poly(vinylidene fluoride)-PVDF) substrates. Samples have been prepared at room temperature varying the argon sputtering pressure, after optimizing other processing conditions. All ZnO:Al films are polycrystalline and preferentially oriented along the  axis. Electrical resistivity around 3.3 x 10(-3) Omega cm and optical transmittance of similar to 85% at 550 nm have been obtained for AZOY films deposited on glass, while a resistivity of 1.7 x 10(-2) Omega cm and transmittance of similar to 70% at 550 nm have been attained in similar coatings on PVDF. One of the main parameters affecting film resistivity seems to be the roughness of the substrate.|
|Appears in Collections:||CDF - GRF - Artigos/Papers (with refereeing)|
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|TSF 517_2009_6290–6293_Structural and electrical properties of Al doped ZnO thin films deposited at room temperature on poly_vinilidene fluoride_ substrates.pdf||292,36 kB||Adobe PDF||View/Open|