Utilize este identificador para referenciar este registo:
https://hdl.handle.net/1822/13730
Título: | Structural study of Si1-xGex nanocrystals embedded in SiO2 films |
Autor(es): | Pinto, S. R. C. Kashtiban, R. J. Rolo, Anabela G. Buljan, M. Chahboun, A. Bangert, U. Barradas, N. P. Alves, E. Gomes, M. J. M. |
Palavras-chave: | Si1−xGex Nanocrystals SiO2 HRTEM GISAXS Raman Flash memory Semiconductor Si Ge 1 - x x |
Data: | 2010 |
Editora: | Elsevier 1 |
Revista: | Thin Solid Films |
Resumo(s): | We have investigated the structural properties of Si1−xGex nanocrystals formed in an amorphous SiO2 matrix by magnetron sputtering deposition. The influence of deposition parameters on nanocrystal size, shape, arrangement and internal structure was examined by X-ray diffraction, Raman spectroscopy, grazing incidence small angle X-ray scattering, and high resolution transmission electron microscopy. We found conditions for the formation of spherical Si1−xGex nanocrystals with average sizes between 3 and 13 nm, uniformly distributed in the matrix. In addition we have shown the influence of deposition parameters on average nanocrystal size and Ge content x. |
Tipo: | Artigo |
URI: | https://hdl.handle.net/1822/13730 |
DOI: | 10.1016/j.tsf.2009.09.148 |
ISSN: | 0040-6090 |
Versão da editora: | http://www.sciencedirect.com/science/article/pii/S0040609009016186 |
Arbitragem científica: | yes |
Acesso: | Acesso restrito UMinho |
Aparece nas coleções: | CDF - FMNC - Artigos/Papers (with refereeing) |
Ficheiros deste registo:
Ficheiro | Descrição | Tamanho | Formato | |
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Structural study of Si1 - xGex nanocrystals embedded in SiO2 films.pdf Acesso restrito! | TSF2010_SiGe | 815,33 kB | Adobe PDF | Ver/Abrir |