Microstrucure and thermal features a-Si:H and nc-Si:H thin films produced by r.f. sputtering

Utilize este identificador para referenciar este registo: https://hdl.handle.net/1822/13970

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Campo DC	Valor	Idioma
dc.contributor.author	Thaiyalnayaki, V.	-
dc.contributor.author	Cerqueira, M. F.	-
dc.contributor.author	Macedo, Francisco	-
dc.contributor.author	Ferreira, J. A.	-
dc.date.accessioned	2011-10-24T10:01:51Z	-
dc.date.available	2011-10-24T10:01:51Z	-
dc.date.issued	2006	-
dc.identifier.isbn	9780878494026	por
dc.identifier.issn	0255-5476	por
dc.identifier.uri	https://hdl.handle.net/1822/13970	-
dc.description.abstract	Amorphous and nanocrystalline silicon thin films have been produced by reactive r.f. sputtering and their microstructure, optical and thermal properties were evaluated. A good correlation was found between the microstructure determined by Raman spectroscopy and X-ray diffraction and the thermal transport parameters	por
dc.description.sponsorship	FCT Project POCTI / CTM / 39395 / 2001	por
dc.language.iso	eng	por
dc.publisher	Trans Tech Publications	por
dc.rights	openAccess	por
dc.subject	Nanocrystalline silicon	por
dc.subject	Thermal properties	por
dc.subject	Structure	por
dc.title	Microstrucure and thermal features a-Si:H and nc-Si:H thin films produced by r.f. sputtering	eng
dc.type	conferencePaper	por
dc.peerreviewed	yes	por
dc.relation.publisherversion	http://www.scientific.net/MSF.514-516.23	por
sdum.publicationstatus	published	por
oaire.citationStartPage	23	por
oaire.citationEndPage	27	por
oaire.citationIssue	PART 1	por
oaire.citationTitle	Materials Science Forum	por
oaire.citationVolume	514-516	por
dc.subject.wos	Science & Technology	por
sdum.journal	Materials Science Forum	por
Aparece nas coleções:	CDF - CEP - Artigos/Papers (with refereeing) CDF - FMNC - Artigos/Papers (with refereeing)

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