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https://hdl.handle.net/1822/14285| Título: | Phosphorous and boron doping of nc-Si:H thin films deposited on plastic |
| Autor(es): | Filonovich, Sergej Ribeiro, M. Rolo, Anabela G. Alpuim, P. |
| Palavras-chave: | Hot-Wire CVD nc-Si:H Phosphine Diborane Low-temperature deposition Doping Plastics |
| Data: | 2007 |
| Editora: | Elsevier 1 |
| Revista: | Thin Solid Films |
| Resumo(s): | Gas-phase phosphorous and boron doping of hydrogenated nanocrystalline thin films deposited by HWCVD at a substrate temperature of 150 °C on flexible-plastic (polyethylene naphthalate, polyimide) and rigid-glass substrates is reported. The influence of the substrate, hydrogen dilution, dopant concentration and film thickness on the structural and electrical properties of the films was investigated. The dark conductivity of B- and P-doped films (σd=2.8 S/cm and 4.7 S/cm, respectively) deposited on plastic was found to be somewhat higher than that found in similar films deposited on glass. n- and p-type films with thickness below ~50 nm have values of crystalline fraction, activation energy and dark conductivity typical of doped hydrogenated amorphous silicon. This effect is observed both on glass and on plastic substrates. |
| Tipo: | Artigo |
| Descrição: | The authors thank Dr. S. Chiussi (University of Vigo) for SIMS measurements. One of the authors (S.A.F.) acknowledges Fundação para a Ciência e Tecnologia (FCT) for a post-doctorate grant. |
| URI: | https://hdl.handle.net/1822/14285 |
| ISSN: | 0040-6090 |
| Versão da editora: | http://www.sciencedirect.com/science/article/pii/S0040609007009819 |
| Arbitragem científica: | yes |
| Acesso: | Acesso restrito UMinho |
| Aparece nas coleções: | CDF - FMNC - Artigos/Papers (with refereeing) |
Ficheiros deste registo:
| Ficheiro | Descrição | Tamanho | Formato | |
|---|---|---|---|---|
| Phosphorous and boron doping of nc-SiH thin films deposited on plastic substrates at 150 °C by Hot-Wire Chemical Vapor Deposition.pdf Acesso restrito! | 307,74 kB | Adobe PDF | Ver/Abrir |
