Utilize este identificador para referenciar este registo: https://hdl.handle.net/1822/17929

TítuloBarium titanate thin films deposited by electrophoresis on p-doped si(001) substrates
Autor(es)Barbosa, José Gusman
Pereira, Mário R.
Moura, C.
Mendes, J. A.
Almeida, B. G.
Palavras-chaveBarium
Titanate
Solgel
Electrophoresis
Barium Titanate Films
Electrophoretic Deposition
Annealing
Raman Spectroscopy
Dielectric Properties
DataOut-2011
EditoraAmerican Scientific Publishers
RevistaJournal of Nanoscience and Nanotechnology
Resumo(s)Barium titanate (BaTiO3) thin films have been prepared by electrophoretic deposition on p-doped and platinum covered silicon (Si) substrates. Their structure, nanostructure and dielectric properties were characterized. The as-deposited films were polycrystalline and composed by barium titanate nanograins with an average grain size ~9 nm. Annealing at high temperatures promoted grain growth, so that the samples annealed at 600 ºC presented average grain sizes ~24 nm. From Raman spectroscopy measurements it was found that the tetragonal (ferroelectric) BaTiO3 phase was stabilized on the films. Also, at higher annealing temperatures, cation disorder was reduced on the films. From measurements of the temperature dependence of the dielectric permittivity the corresponding paraelectric-ferroelectric phase transition was determined. The observed transition temperature (~100ºC) was found to be below the BaTiO3 bulk or thick film values, due to the small nanosized grains composing the films.
TipoArtigo
URIhttps://hdl.handle.net/1822/17929
DOI10.1166/jnn.2011.3494
ISSN1533-4880
Versão da editorahttp://www.ingentaconnect.com/
Arbitragem científicayes
AcessoAcesso restrito UMinho
Aparece nas coleções:CDF - FAMO - Artigos/Papers (with refereeing)

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