Utilize este identificador para referenciar este registo:
https://hdl.handle.net/1822/30823
Título: | Optimized SU-8 processing for low-cost microstructures fabrication without cleanroom facilities |
Autor(es): | Pinto, V. C. Sousa, Paulo J. Cardoso, Vanessa Fernandes Minas, Graça |
Palavras-chave: | SU-8 UV photolithography Low-cost microfabrication Without cleanroom facility Microfluidic MEMS |
Data: | Set-2014 |
Editora: | MDPI |
Revista: | Micromachines |
Citação: | Micromachines 2014, 5, 738-755 |
Resumo(s): | The study and optimization of epoxy-based negative photoresist (SU-8) microstructures through a low-cost process and without the need for cleanroom facility is presented in this paper. It is demonstrated that the Ultraviolet Rays (UV) exposure equipment, commonly used in the Printed Circuit Board (PCB) industry, can replace the more expensive and less available equipment, as the Mask Aligner that has been used in the last 15 years for SU-8 patterning. Moreover, high transparency masks, printed in a photomask, are used, instead of expensive chromium masks. The fabrication of well-defined SU-8 microstructures with aspect ratios more than 20 is successfully demonstrated with those facilities. The viability of using the gray-scale technology in the photomasks for the fabrication of 3D microstructures is also reported. Moreover, SU-8 microstructures for different applications are shown throughout the paper. |
Tipo: | Artigo |
URI: | https://hdl.handle.net/1822/30823 |
DOI: | 10.3390/mi5030738 |
ISSN: | 2072-666X |
Versão da editora: | www.mdpi.com/journal/micromachines |
Arbitragem científica: | yes |
Acesso: | Acesso aberto |
Aparece nas coleções: | CAlg - Artigos em revistas internacionais / Papers in international journals DEI - Artigos em revistas internacionais |
Ficheiros deste registo:
Ficheiro | Descrição | Tamanho | Formato | |
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Micromachines V5 p738 2014_SU8_VaniaPinto.pdf | Documento principal | 4,81 MB | Adobe PDF | Ver/Abrir |