Utilize este identificador para referenciar este registo: https://hdl.handle.net/1822/3535

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dc.contributor.authorSencadas, Vítor João Gomes Silva-
dc.contributor.authorBarbosa, R.-
dc.contributor.authorMano, J. F.-
dc.contributor.authorLanceros-Méndez, S.-
dc.date.accessioned2005-11-18T15:32:12Z-
dc.date.available2005-11-18T15:32:12Z-
dc.date.issued2003-
dc.identifier.citation"Ferroelectrics". ISSN 0015-0193. 294 (2003) 61-71.eng
dc.identifier.issn0015-0193eng
dc.identifier.urihttps://hdl.handle.net/1822/3535-
dc.description.abstractTensile dynamic mechanical analysis at 1 Hz was used to characterize the solid rheological properties of ß-PVDF films. Both the elastic and loss moduli and the specific damping capacity were monitored against temperature, allowing the study of the effect of anisotropy upon the viscoelastic properties of the films. The temperature range covered the ß- and alpha-relaxations. These results are compared to dielectric relaxation results in order to elucidate the electrical and mechanical contributions to the observed relaxations. Further, an important shrinking effect upon heating above 364 K has been observed, that influences the material properties. This geometrical effect has been monitored by thermal mechanical analysis. The thermal coefficients of linear expansion have been calculated, giving two different regimes for this parameter. The variations at a molecular level have been monitored by FTIR.eng
dc.description.sponsorshipFundação para a Ciência e Tecnologia (FCT) - Programa Operacional "Ciência, Tecnologia, Inovação" (POCTI) - POCTI/CTM/33501/99.por
dc.language.isoengeng
dc.publisherTaylor & Franciseng
dc.rightsopenAccesseng
dc.subjectPVDFeng
dc.subjectInfraredeng
dc.subjectDielectric relaxationeng
dc.subjectMechanical relaxationeng
dc.titleMechanical characterization and influence of the high temperature shrinkage of ß-PVDF films on its electromechanical propertieseng
dc.typeconferencePaperpor
dc.peerreviewedyeseng
dc.relation.publisherversionhttp://www.tandf.co.uk/journals/titles/00150193.aspeng
sdum.pagination61-71eng
sdum.publicationstatuspublishedeng
sdum.volume294eng
oaire.citationStartPage61por
oaire.citationEndPage71por
oaire.citationVolume294por
dc.identifier.doi10.1080/00150190390238621por
dc.subject.wosScience & Technologypor
sdum.journalFerroelectricspor
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