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https://hdl.handle.net/1822/61326
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Campo DC | Valor | Idioma |
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dc.contributor.author | Costa, Pedro Miguel Pinto | por |
dc.contributor.author | Al-Rjoub, A. | por |
dc.contributor.author | Rebouta, L. | por |
dc.contributor.author | Manninen, Nora Kristiina Alves Sousa | por |
dc.contributor.author | Alves, D. | por |
dc.contributor.author | Almeida, B. G. | por |
dc.contributor.author | Barradas, N. P. | por |
dc.contributor.author | Alves, E. | por |
dc.date.accessioned | 2019-09-06T12:59:55Z | - |
dc.date.available | 2019-09-06T12:59:55Z | - |
dc.date.issued | 2019 | - |
dc.identifier.citation | Thin Solid Films 669 (2019) 475–481 | por |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | https://hdl.handle.net/1822/61326 | - |
dc.description | "Available online 22 November 2018" | por |
dc.description.abstract | This work presents a study on the influence of the Al/Si atomic ratio in dc magnetron sputtered Al1-xSixOy amorphous and transparent films upon their chemical composition, films' structure, optical and electrical properties. Increasing silicon in Al1-xSixOy films, from 0 at.% up to 31.1 at.%, caused an increment of deposition rate and an increment in Al-O-Si energy bonds as confirmed by X-Ray Photoelectron Spectroscopy (XPS) analysis. On other hand, the optical constants (refractive index (n) and extinction coefficient (k)), dielectric constant, loss tangent (tan δ) and ac conductivity (σac) decrease when the amount of silicon in films increased. The results show that the refractive index shows small variations from linearity with vol% of Al2O3 (or SiO2). Dielectric constant and dielectric loss evidenced two dipolar contributions, attributed to defects located one at or near the substrate/oxide interface, and the other in the bulk of the oxide | por |
dc.description.sponsorship | The authors acknowledge the support of FCT in the framework ofthe Strategic Funding UID/FIS/04650/2013 and thefinancial supportof FCT, POCI and PORL operational programs through the project POCI-01-0145-FEDER-016907 (PTDC/CTM-ENE/2882/2014), co-financed byEuropean community fund FEDER. The authors also acknowledge thesupport of the European Structural and Investment Funds in the FEDERcomponent, through the Operational Competitiveness andInternationalization Programme (COMPETE 2020) [Project n° 002814;Funding Reference: POCI-01-0247-FEDER-002814]. | por |
dc.language.iso | eng | por |
dc.publisher | Elsevier B.V. | por |
dc.relation | info:eu-repo/grantAgreement/FCT/5876/147414/PT | por |
dc.rights | openAccess | por |
dc.subject | Sputtered Al1-xSixOy | por |
dc.subject | Optical properties | por |
dc.subject | Dielectric properties | por |
dc.subject | Electrical conductivity | por |
dc.subject | Sputtering | por |
dc.subject | Aluminum silicon oxide | por |
dc.title | Influence of Al/Si atomic ratio on optical and electrical properties of magnetron sputtered Al1-xSixOy coatings | por |
dc.type | article | por |
dc.peerreviewed | yes | por |
dc.relation.publisherversion | www.elsevier.com/locate/tsf | por |
oaire.citationStartPage | 475 | por |
oaire.citationEndPage | 481 | por |
oaire.citationVolume | 669 | por |
dc.identifier.doi | 10.1016/j.tsf.2018.11.036 | por |
dc.subject.fos | Ciências Naturais::Ciências Físicas | por |
dc.subject.wos | Science & Technology | por |
sdum.journal | Thin Solid Films | por |
oaire.version | AM | por |
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Thin Solid Films 669_2019_475–481_Influence of Al-Si atomic ratio on optical and electrical properties of magnetron sputtered Al1-xSixOy coatings.pdf | 550,68 kB | Adobe PDF | Ver/Abrir |