Semiconductor layer thickness impact on optical and resistive switching behavior of pulsed laser deposited BaTiO3/ZnO heterostructures
| dc.contributor.author | Sekhar, K. C. | por |
| dc.contributor.author | Silva, J. P. B. | por |
| dc.contributor.author | Kamakshi, Koppole | por |
| dc.contributor.author | Pereira, Mário | por |
| dc.contributor.author | Gomes, M. J. M. | por |
| dc.date.accessioned | 2015-02-18T15:19:07Z | |
| dc.date.available | 2015-02-18T15:19:07Z | |
| dc.date.issued | 2013 | |
| dc.description.abstract | This work reports the impact of ZnO layer thickness on optical and resistive switching behavior of BaTiO3/ZnO heterostructures grown by pulsed laser deposition. The interface polarization coupling becomes more efficient and causes a remarkable change in heterostructure properties with decrease in ZnO layer thickness. The heterostructure with ZnO thickness of 25 nm displays the enhanced resistive switching characteristics with switching ratio ≈106 and good stability in low and high resistance states. Moreover, the photoluminescence spectrum exhibits two additional blue emissions when ZnO thickness is ≤50 nm and their mechanism is highlighted based on interface band offset and interface polarization coupling effect. | por |
| dc.description.sponsorship | This study has been partially funded by: (i) FEDER through the COMPETE Program and by the Portuguese Foundation for Science and Technology (FCT) under the projects PTDC/FIS/098943/2008 and PEST-C/FIS/UI607/2011; (ii) European COST Actions MP0901-NanoTP and MP0903-NanoAlloy. The authors K. C. S., J.P.B.S., and K. K. are grateful for financial support through the FCT Grant Nos. SFRH/BPD/68489/2010, SFRH/BD/44861/2008, and SFRH/BPD/87215/2012, respectively. The authors would also like to thank Engineer Jose Santos for technical support at Thin Film Laboratory. | por |
| dc.distribution | international | por |
| dc.identifier.doi | 10.1063/1.4809531 | por |
| dc.identifier.issn | 0003-6951 | por |
| dc.identifier.uri | https://hdl.handle.net/1822/33983 | |
| dc.language.iso | eng | por |
| dc.peerreviewed | yes | por |
| dc.publisher | American Institute of Physics | por |
| dc.rights | restrictedAccess | por |
| dc.subject.wos | Science & Technology | por |
| dc.title | Semiconductor layer thickness impact on optical and resistive switching behavior of pulsed laser deposited BaTiO3/ZnO heterostructures | por |
| dc.type | article | por |
| dspace.entity.type | Publication | en |
| oaire.citationIssue | 21 | por |
| oaire.citationTitle | Applied Physics Letters | por |
| oaire.citationVolume | 102 | por |
| sdum.journal | Applied Physics Letters | por |
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