Effect of rapid thermal annealing on texture and properties of pulsed laser deposited zinc oxide thin films

dc.contributor.authorSekhar, K. C.por
dc.contributor.authorLevichev, S.por
dc.contributor.authorKamakshi, Koppolepor
dc.contributor.authorDoyle, B.por
dc.contributor.authorChahboun, A.
dc.contributor.authorGomes, M. J. M.
dc.date.accessioned2015-02-17T17:33:57Z
dc.date.available2015-02-17T17:33:57Z
dc.date.issued2013
dc.description.abstractA comparative study on the properties of pulsed laser deposited ZnO thin films as a function of rapid thermal annealing temperature (Ta) is presented. Grazing incidence x-ray diffraction pattern reveals that preferred orientation of the films changes from (002) to (103) as Ta varies from 500 to 800 1C. A clear correlation between grain morphology and texture formation is noticed. Photoluminescence spectra of all films show a strong near-band-edge ultraviolet (UV) emission and the UV emission intensity increases with Ta. Simultaneously, a weak and broad green emission centered at 505 nm corresponds to oxygen vacancies also emerged in the films annealed at TaZ600 1C. A significant hysteresis behavior is observed in current–voltage characteristics and attributed to trapping/ de-trapping driven effect. It is shown that high resistance state is dominated by space charge limited currents and low resistance state is governed by both Pool–Frenkel (2–5 V) and Schottky emission (0–2 V).por
dc.description.sponsorshipThis study has been partially funded by: (i) FEDER through the COMPETE Program and by the Portuguese Foundation for Science and Technology (FCT) under the projects PTDC/FIS/098943/2008 and PEST-C/FIS/UI607/2011; (ii) European COST Actions MP0901-NanoTP and MP0903-NanoAlloy. We acknowledge the Synchrotron Light Source ANKA for provision of beamtime at the PDIFF beamline and financial support for our participation at the experiments under proposal MNT-123. The authors K.C.S. and K.K. are grateful for financial support through the FCT grants SFRH/BPD/68489/2010 and SFRH/BPD/87215/2012 respectively. The authors would also like to thank Engineer Jose Santos for technical support at Thin Film Laboratory.por
dc.distributioninternationalpor
dc.identifier.doi10.1016/j.matlet.2013.02.032por
dc.identifier.issn0167-577Xpor
dc.identifier.urihttps://hdl.handle.net/1822/33967
dc.language.isoengpor
dc.peerreviewedyespor
dc.publisherElsevierpor
dc.rightsrestrictedAccesspor
dc.subjectZnO thin filmspor
dc.subjectRapid thermal annealingpor
dc.subjectGrazing incidence x-ray diffractionpor
dc.subjectPhotoluminescencepor
dc.subjectElectrical propertiespor
dc.subject.wosScience & Technologypor
dc.titleEffect of rapid thermal annealing on texture and properties of pulsed laser deposited zinc oxide thin filmspor
dc.typearticlepor
dspace.entity.typePublicationen
oaire.citationEndPage152por
oaire.citationStartPage149por
oaire.citationTitleMaterials Letterspor
oaire.citationVolume98por
sdum.journalMaterials Letterspor

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