Phosphorous and boron doping of nc-Si:H thin films deposited on plastic

dc.contributor.authorFilonovich, Sergej
dc.contributor.authorRibeiro, M.
dc.contributor.authorRolo, Anabela G.
dc.contributor.authorAlpuim, P.
dc.date.accessioned2011-11-14T11:51:03Z
dc.date.available2011-11-14T11:51:03Z
dc.date.issued2007
dc.date.submitted2008-01-15
dc.descriptionThe authors thank Dr. S. Chiussi (University of Vigo) for SIMS measurements. One of the authors (S.A.F.) acknowledges Fundação para a Ciência e Tecnologia (FCT) for a post-doctorate grant.por
dc.description.abstractGas-phase phosphorous and boron doping of hydrogenated nanocrystalline thin films deposited by HWCVD at a substrate temperature of 150 °C on flexible-plastic (polyethylene naphthalate, polyimide) and rigid-glass substrates is reported. The influence of the substrate, hydrogen dilution, dopant concentration and film thickness on the structural and electrical properties of the films was investigated. The dark conductivity of B- and P-doped films (σd=2.8 S/cm and 4.7 S/cm, respectively) deposited on plastic was found to be somewhat higher than that found in similar films deposited on glass. n- and p-type films with thickness below ~50 nm have values of crystalline fraction, activation energy and dark conductivity typical of doped hydrogenated amorphous silicon. This effect is observed both on glass and on plastic substrates.por
dc.identifier.issn0040-6090por
dc.identifier.urihttps://hdl.handle.net/1822/14285
dc.language.isoengpor
dc.peerreviewedyespor
dc.publisherElsevierpor
dc.relation.publisherversionhttp://www.sciencedirect.com/science/article/pii/S0040609007009819por
dc.rightsrestrictedAccesspor
dc.subjectHot-Wire CVDpor
dc.subjectnc-Si:Hpor
dc.subjectPhosphinepor
dc.subjectDiboranepor
dc.subjectLow-temperature depositionpor
dc.subjectDopingpor
dc.subjectPlasticspor
dc.titlePhosphorous and boron doping of nc-Si:H thin films deposited on plasticpor
dc.typearticlepor
dspace.entity.typePublicationen
oaire.citationEndPage579por
oaire.citationIssue5por
oaire.citationStartPage576por
oaire.citationTitleThin Solid Filmspor
oaire.citationVolume516por
sdum.journalThin Solid Filmspor
sdum.publicationstatuspublishedpor

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Phosphorous and boron doping of nc-SiH thin films deposited on plastic substrates at 150 °C by Hot-Wire Chemical Vapor Deposition.pdf
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