Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering (vol152, pg 252, 2018)

dc.contributor.author	Correia, F. C.	por
dc.contributor.author	Salvador, P. B.	por
dc.contributor.author	Ribeiro, J. M.	por
dc.contributor.author	Mendes, A.	por
dc.contributor.author	Tavares, C. J.	por
dc.date.accessioned	2021-05-28T18:33:48Z
dc.date.available	2021-05-28T18:33:48Z
dc.date.issued	2018
dc.date.updated	2021-05-26T17:57:50Z
dc.description.abstract	The authors regret the published article included incorrect Power Factor values in graphs of Figures 4 and 10b). This also means that the values in the body of the text were also incorrect. Additionally, figures 2, 3, 8, 9, 13 and 14 included a formatting error in the top X axis of the graphs. The authors would like to apologise for any inconvenience caused.	por
dc.description.sponsorship	- (undefined)	por
dc.distribution	international	por
dc.identifier.doi	10.1016/j.vacuum.2018.05.037	por
dc.identifier.issn	0042-207X
dc.identifier.uri	https://hdl.handle.net/1822/73071
dc.language.iso	eng	por
dc.peerreviewed	yes	por
dc.publisher	Elsevier	por
dc.relation.publisherversion	https://www.sciencedirect.com/science/article/pii/S0042207X18308534	por
dc.rights	openAccess	por
dc.subject.wos	Science & Technology
dc.title	Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering (vol152, pg 252, 2018)	por
dc.type	corrigendum	por
dspace.entity.type	Publication	en
oaire.citationEndPage	340	por
oaire.citationStartPage	340	por
oaire.citationVolume	154	por
sdum.export.identifier	10890
sdum.journal	Vacuum	por

Ficheiros

A mostrar 1 - 1 de 1