Utilize este identificador para referenciar este registo:
https://hdl.handle.net/1822/73071| Título: | Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering (vol152, pg 252, 2018) |
| Autor(es): | Correia, F. C. Salvador, P. B. Ribeiro, J. M. Mendes, A. Tavares, C. J. |
| Data: | 2018 |
| Editora: | Elsevier 1 |
| Revista: | Vacuum |
| Resumo(s): | The authors regret the published article included incorrect Power Factor values in graphs of Figures 4 and 10b). This also means that the values in the body of the text were also incorrect. Additionally, figures 2, 3, 8, 9, 13 and 14 included a formatting error in the top X axis of the graphs. The authors would like to apologise for any inconvenience caused. |
| Tipo: | Corrigenda |
| URI: | https://hdl.handle.net/1822/73071 |
| DOI: | 10.1016/j.vacuum.2018.05.037 |
| ISSN: | 0042-207X |
| Versão da editora: | https://www.sciencedirect.com/science/article/pii/S0042207X18308534 |
| Arbitragem científica: | yes |
| Acesso: | Acesso aberto |
| Aparece nas coleções: | CDF - GRF - Outros Documentos/Other Documents (without refereeing) |
Ficheiros deste registo:
| Ficheiro | Descrição | Tamanho | Formato | |
|---|---|---|---|---|
| 2019-Vacuum_CJTavares corrigendum.pdf | 236,46 kB | Adobe PDF | Ver/Abrir |
